{
  "url": "https://fahrplan.events.ccc.de/rc3/2020/Fahrplan/events/11364.html",
  "id": 11364,
  "guid": "8f3ef0f5-4929-48b1-87b7-781245aae7ac",
  "logo": "/system/events/logos/000/011/364/large/n00dl0r.jpg?1605117415",
  "date": "2020-12-30T14:00:00+01:00",
  "start": "14:00",
  "duration": "00:40",
  "room": "rC2",
  "slug": "rc3-11364-i_could_not_resist",
  "title": "I could not resist",
  "subtitle": "Resists for Electron Beam Lithography (EBL)",
  "track": "Hardware & Making",
  "type": "Talk",
  "language": "en",
  "abstract": "Photoresists are one of the essential ingredients for chip manufacturing and micro/nano engineering.\r\nWe will show how we\u2019re using them in a DIY Electron Beam Lithography set-up and how you\u2019re able to cook your own cheap resists and mix your own developers.",
  "description": "<!DOCTYPE html>\r\n<html>\r\n<body>\r\n<h2>Resists? What&apos;s that?</h2>\r\n<ul>\r\n    <li>What are their applications</li>\r\n    <li>How does it work (types (positive/negative), chemistry, proximity effect, dosage etc)</li>\r\n</ul>\r\n\r\n<h2>EBL? What&apos;s that?</h2>\r\n<ul>\r\n    <li>How does it work</li>\r\n    <li>Pros &amp; cons:  comparison between EBL (slow) photolithography (fast)</li>\r\n    <li>Which resist can I use for EBL</li>\r\n</ul>\r\n\r\n<h2>DIY cooking of PMMA based resists</h2>\r\n<ul>\r\n    <li>Comparison of different solvents</li>\r\n</ul>\r\n\r\n<h2>Composition of different developers</h2>\r\n<ul>\r\n    <li>Comparison of different developers</li>\r\n</ul>\r\n\r\n<h2>Applications</h2>\r\n<ul>\r\n    <li>Usage as a mask</li>\r\n    <li>Usage as a structural dielectric material</li>\r\n    <li> ...(?)</li>\r\n</ul>\r\n<h2>The EBL exposure process</h2>\r\n<ul>\r\n    <li>simple SEM retrofitted with an EBL controller</li>\r\n    <li>The common file formats (GDSII &amp; OASIS)</li>\r\n    <li>Scan-Gen: how to generate the proper curves for the exposure</li>\r\n    <li>Hardware: off-the-shelf embedded modules like the RedPitaya</li>\r\n    <li>Generation of different filling curve styles, calibration, compensation of the proximity effect, correction of the SEMs intrinsic parameters, dosage!</li>\r\n    <li>Fiducial detection and alignment for multi-pass/multi-layer processes</li>\r\n</ul>\r\n<h2>Stuff comes together</h2>\r\n<ul>\r\n    <li>walk through the complete process along a simple example</li>\r\n</ul>\r\n\r\n<h2>More Examples</h2>\r\n\r\n<h2>Thanks & Credits</h2>\r\n\r\n<h2>Q & A</h2>\r\n\r\n</body>\r\n</html>\r\n",
  "recording_license": "",
  "do_not_record": false,
  "persons": [
    {
      "id": 12148,
      "public_name": "N00DL3"
    }
  ],
  "links": [],
  "attachments": [],
  "room_id": "32b5ad05-ab7d-44eb-a6e6-7ca616eed34a",
  "origin": null
}